X-Ray Photoelectron Spectrometer (XPS)

X-ray photoelectron spectroscopy (XPS) is the most used surface analytical technique. For the outermost ten nanometers of a material, it provides semi-quantitative elemental compositions and oxidation state or chemical bonding information. XPS can detect any element except hydrogen and helium with a detection limit of about 0.3 atomic percent. Most materials stable in ultrahigh vacuum can be analyzed with little to no sample preparation. Ion-sputtering depth profiling also allows for data to be collected for up to a couple of microns depth. 

Typical Applications

  • Determination of surface composition and bonding
  • Mapping lateral variation of surface chemistry down to ~3 micrometers (µm)
  • Nondestructive elemental depth profiles
  • Destructive elemental depth profiles several thousand angstrom (Å) into the sample
  • Variable temperature analysis 

Instruments

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ThermoFisher Scientific ESCALAB Qxi XPS 
  • Monochromatized aluminum and gold X-ray sources 
  • Non-monochromatized magnesium and titanium X-ray sources 
  • UV radiation lamp for UPS analysis 
  • Argon (Ar) source for depth profiling, capable of producing both cluster ions and atomic Ar+ ions 
  • Integrated laser for Raman spectroscopy coincident with XPS analysis
  • Hot and cold stage for variable temperature analysis
  • Spatial resolution of less than 3 µm
  • Holds samples up to 7mm thick 
ThermoFisher Scientific E S C A L A B 250 X P S
ThermoFisher Scientific ESCALAB 250 XPS 
  • Monochromatized aluminum X-ray source 
  • Non-monochromatized magnesium and zirconium X-ray sources  
  • UV radiation lamp for UPS analysis
  • Ar+ source for depth profiling 

 

Instrument Contact: Stephen Golledge