Dual Beam - Focused Ion Beam Microscopy (DB-FIB)
FEI Helios Dual Beam FIB
Work screen showing various views of the DB-FIB instrument
Instrument Calendar:
FIB Provides:
- Field emission electron and ion beam sources, allowing high resolution SEM imaging and excellent ion beam density
- Omniprobe micromanipulators for in-situ sample manipulation
- Electron flood gun charge neutralizer to assist in milling insulation substrates
- Quorum cryo transfer system for beam sensitive materials such as polymers or biological specimens
- Three gas injection systems to assist with electron/ion beam metal deposition, and ion milling applications (Pt, Insulator enhanced etch (XeF2), Selective carbon mill)
- 5-axes eucentric stage
- 16-bit patterning system
- STEM, Thru-lens immersion, Everhart-Thornley, and CDEM detectors
Typical Applications:
- Site specific preparation of cross sections for high resolution SEM and TEM analysis.
- Deposition of metal contacts to devices
- SEM and Ion beam imaging of substrates