ZEISS Ultra-55 Scanning Electron Microscope

FESEM Capabilities:

  • Field emission electron beam source with 1nm SEM imaging resolution
  • Nabity NPGS electron beam lithography system
  • Large chamber capacity
  • 5-axes stage able to view/write an entire 4″ wafer.
  • In-Lens SE, In-Lens BSE, and Everhart-Thornley electron detectors
  • Oxford 10mm SDD detector for X-ray analysis and mapping

Typical Applications:

  • High resolution SEM imaging
  • Electron beam lithography
  • Elemental analysis via energy dispersive x-ray spectroscopy
University of Oregon