ZEISS Ultra-55 Scanning Electron Microscope

FESEM Capabilities:

• Field emission electron beam source with 1nm SEM imaging resolution
• Nabity NPGS electron beam lithography system
• Large chamber capacity
• 5-axes stage able to view/write an entire 4″ wafer.
• In-Lens SE, In-Lens BSE, and Everhart-Thornley electron detectors
• Oxford 10mm SDD detector for X-ray analysis and mapping

Typical Applications:

• High resolution SEM imaging
• Electron beam lithography
• Elemental analysis via energy dispersive x-ray spectroscopy