Woollam M44 Spectroscopic Ellipsometer
Spectroscopic Ellipsometry entails:
- Ellipsometry uses polarized light to measure the changes in the polarization state of light reflected from the sample surface.
- The optical parameters n and k of a material are determined for a number of wavelengths, which yields information about the composition and electronic structure.
- Film thickness and, in some cases, interfacial roughness can be determined for multilayer systems.
- Optical technique primarily used to characterize thin films.
- Investigating overlayer roughness, interface, alloy composition, degree of crystallinity, anisotropic and graded layers.
- Characterize multilayer systems and materials at the nano scale, a technique that is well established in the semiconductor, flat panel display, thin film coating and solar cell industries.
- Under intense development in other disciplines such as biology as it is very sensitive to small changes that can happen at the sample surface.