UO Home Page
 University of Oregon - Lorry I. Lokey Laboratories
Nanofabrication banner
Dual Beam - Focused Ion Beam Microscopy
(DB-FIB)
FEI Helios Dual Beam FIB
Cameca SX100
FIB
Work screen showing various views of the DB-FIB instrument
 
Instrument Calendar: FIB Provides:
  • Field emission electron and ion beam sources, allowing high resolution SEM imaging and excellent ion beam density
  • Omniprobe micromanipulators for in-situ sample manipulation
  • Electron flood gun charge neutralizer to assist in milling insulation substrates
  • Quorum cryo transfer system for beam sensitive materials such as polymers or biological specimens
  • Three gas injection systems to assist with electron/ion beam metal deposition, and ion milling applications (Pt, Insulator enhanced etch (XeF2), Selective carbon mill)
  • 5-axes eucentric stage
  • 16-bit patterning system
  • STEM, Thru-lens immersion, Everhart-Thornley, and CDEM detectors
Typical Applications:
  • Site specific preparation of cross sections for high resolution SEM and TEM analysis.
  • Deposition of metal contacts to devices
  • SEM and Ion beam imaging of substrates
 
 
UO home page
CAMCOR home page