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| Reconstructed digital elevation model (DEM) of wrinkled glass surface at 500 X, using stereo imaging in the SEM |
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Instrument Calendar:
FESEM Capabilities:
- Field emission electron beam source with 1nm SEM imaging resolution
- Nabity NPGS electron beam lithography system
- Large chamber capacity
- 5-axes stage able to view/write an entire 4" wafer.
- In-Lens SE, In-Lens BSE, and Everhart-Thornley electron detectors
- Oxford 10mm SDD detector for X-ray analysis and mapping
Typical Applications:
- High resolution SEM imaging
- Electron beam lithography
- Elemental analysis via energy dispersive x-ray spectroscopy
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